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1um Precision Vision Calibration Target Calibration Board with Customizable Size and Glass Ceramic Film Aluminum Material
Machine Vision Calibration Target
,High Precision Vision Calibration Target
,Circular Dot Calibration Board
The circular dot calibration board is a high-precision calibration tool engineered for optical systems. It ensures accurate camera calibration, lens distortion correction, and reliable system performance evaluation. Manufactured using advanced photolithography technology, the board delivers micron-level precision, making it well suited to high-resolution imaging systems and microscopic applications. Its durable, heat-resistant material provides long-term stability, while the precise dot pattern maintains uniformity across the entire board for consistent, repeatable calibration results. The board is fully customizable to meet a wide range of calibration requirements, making it ideal for industrial cameras, robotics, and automated vision systems.
- Sharp edges for clean, well-defined pattern boundaries
- High positional accuracy across the full board area
- Low expansion coefficient for dimensional stability under temperature variation
- High precision with a maximum accuracy of 1 µm
- Customization support for patterns, sizes, and base materials
Designed for machine vision calibration across a broad range of equipment, including security systems, film and television production, medical imaging, cameras, drone cameras, photography studios, scientific research instruments, and other precision optical devices.
The base material of the dot calibration plate is selectable. Different substrates — such as glass, ceramic, film, and aluminum plate — can be customized according to the intended usage scenario, operating environment, and accuracy requirements.
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Glass substrate | Quartz glass (fused silica) / soda glass |
| Minimum line width | 1 µm / 0.55 µm | Transmittance rate (@550nm) | >95% |
| Feature accuracy | ±1 µm | Coefficient of thermal expansion (20–200°C) | <5.0×10⁻⁷/K |
| Coating | Yellow chromium, bright chromium, blue chromium (low reflectivity) | Expansion ratio (20–200°C) | 0.00006% (0.6 µm/°C of 1 m) |
| Reflectance | <13.4% @550nm <1.8% @650nm <2.67% @750nm | Surface flatness | <0.55 µm (length <50 mm) <2 µm (length <100 mm) <5 µm (length >100 mm) |
| Coating accuracy | 120 nm (±0.20 nm) | Surface roughness | <0.025 µm |
| Optical density (OD) | Yellow chromium 3 (blue 5) | Thickness | 1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm); 500×500×4.8 mm |
| White background | Minimum line width: 10 µm White background thickness: 40 µm (smooth white coating on the back) | Minimum / maximum size | Min: 2×2 mm Max: 800×960 mm (±0.1 mm) |
| Positive & negative shapes | Positive: pattern opaque Negative: pattern translucent | Appearance and shape | Square |
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Type | Matte chromium on matte ceramic; bright chrome on glossy ceramic |
| Type | Matte ceramic / glossy ceramic | Ceramic substrate | Zirconia / alumina |
| Minimum line width | 4 µm (matte) / 2 µm (glossy) | Thickness | 1 mm (±0.1 mm, common); 2 mm (common); 3 mm (±0.1 mm) |
| Feature accuracy | ±2 µm | Surface flatness | <30 µm (length <100 mm); <60 µm (length <200 mm) |
| Appearance accuracy | ±0.05 mm | Size range | Min: 2×2 mm (±0.1 mm); max: 228×228 mm (±0.1 mm) |
| Coating | Chromium | Surface roughness | <0.2–0.7 µm |
| Light / matte coating | Matte chromium coating / bright chrome coating | Coefficient of thermal expansion (40–400°C) | <6.7×10⁻⁶/K |
| Reflectance | Matte: <12.88% @550nm; <10.62% @650nm; <12.23% @750nm Glossy: <9.56% @550nm; <1.89% @650nm; <11.168% @750nm | Unit weight | ≥3.66 g/cm³ |
| Coating thickness | 100–120 nm | Rockwell hardness | ≥80 HRA |
| Positive and negative shapes | Positive film: opaque pattern Negative film: transparent pattern | Appearance and shape | Laser cutting of any shape; square; ellipse |
| Protective layer | Thin film above the chromium layer improves durability of the chromium pattern | Special shape | Punch, chamfer, oblique angle |
| Design | Specification | Film Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Lithography (film lithography machine) | Application | Used for transmission / backlight / functional testing |
| Minimum line width | 10 µm / 30 µm optional | Coefficient of expansion | Film shrinks when heated and expands when cooled |
| Feature accuracy | ±10 µm | Dimensional stability | 10 µm/°C of 1 m. At constant relative temperature, a 1% humidity change causes a 1 m film to change by 10 µm (one ten-thousandth) |
| Coating | Silver bromide | Transmittance rate (400–700 nm) | >90%; ultraviolet <(400–700 nm)> infrared |
| Coating thickness | 2 µm | Film substrate thickness | 0.18 mm (±0.01 mm) |
| Optical density (OD) | OD >4 at 100% black (OD value controllable in grayscale) | Maximum size | 0.71×0.81 m (±0.1 mm) with minimum line width 10 µm 1.68×3.5 m (±0.1 mm) with minimum line width 30 µm |
| Color | Black grayscale, sine grayscale | Appearance | Laser cutting, straight edge cutting, and circular hole hollowing available |
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