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Customizable Size Chromium Coating Circular Dot Calibration Board Quartz Glass Dot Calibration Target for Machine Vision
Customizable Dot Calibration Board
,Dot Calibration Board Chromium Coating
The dot calibration grid is one of the most commonly used high-precision calibration tools in machine vision, industrial measurement, and computer vision — on par with the checkerboard calibration grid. It consists of an array of circular black-and-white dots, typically categorized as symmetrical or asymmetrical dot arrays.
- Extremely high sub-pixel accuracy: Dots possess natural geometric symmetry. By fitting the boundary of the entire circle or calculating the centroid, the algorithm can aggregate information from hundreds or thousands of pixels to determine the center position, achieving positioning accuracy generally superior to traditional corner points such as checkerboard corners.
- Strong anti-distortion capability: Under conditions of wide viewing angles or severe lens distortion, feature extraction from dot arrays is more stable than from square corner points, reducing the likelihood of feature point drift or misidentification.
- High orientation discrimination: The asymmetric circle grid introduces a unique asymmetry in dot arrangement, allowing the algorithm to automatically determine the orientation of the calibration grid from a single image and avoiding calculation errors caused by orientation reversal.
- Camera-based distortion calibration: Used to accurately calculate the camera's focal length, optical center, and lens distortion coefficient prior to machine vision 3D reconstruction, binocular stereo vision, or monocular ranging.
- Industrial high-precision measurement and photogrammetry: Commonly used in aerial photography, large workpiece 3D measurement, and automotive manufacturing, where high precision is required.
- Robot eye-hand calibration: Used in conjunction with the end-effector camera to establish precise mathematical transformations between the camera coordinate system and the robot arm coordinate system.
Parameters and materials can be customized; custom designs based on provided drawings are also available. The dot calibration plate substrate is optional — different substrates (such as glass, ceramics, film, aluminum plates, etc.) can be customized according to different application scenarios, environments, and precision requirements. The following are some commonly used substrate parameter specifications.
| Manufacturing Process | Photolithography | Glass Substrate | Quartz glass (fused silica) / soda glass |
| Minimum Line Width | 1 µm / 0.55 µm | Transmittance Rate (@550nm) | >95% |
| Feature Accuracy | ±1 µm | Coefficient of Thermal Expansion (20–200°C) | <5.0×10⁻⁷/K |
| Coating | Yellow chromium, bright chromium, blue chromium (low reflectivity) | Expansion Ratio (20–200°C) | 0.00006% (0.6 µm/°C of 1 m) |
| Reflectance | <13.4% @550nm <1.8% @650nm <2.67% @750nm |
Surface Flatness | <0.55 µm (length <50 mm) <2 µm (length <100 mm) <5 µm (length >100 mm) |
| Coating Accuracy | 120 nm (±0.20 nm) | Surface Roughness | <0.025 µm |
| Optical Density (OD) | Yellow Chromium 3 (Blue 5) | Thickness | 1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm); 500×500×4.8 mm |
| White Background | Minimum line width: 10 µm White background thickness: 40 µm (smooth white coating on the back) |
Minimum / Maximum Size | Min: 2×2 mm Max: 800×960 mm (±0.1 mm) |
| Positive & Negative Shapes | Positive: pattern opaque Negative: pattern translucent |
Appearance and Shape | Square |
| Manufacturing Process | Photolithography | Type | Matte chromium on matte ceramics; bright chrome on glossy ceramics |
| Type | Matte ceramic; glossy ceramic | Ceramic Substrate | Zirconia / Alumina |
| Minimum Line Width | 4 µm (matte) / 2 µm (glossy) | Thickness | 1 mm (±0.1 mm, common); 2 mm (common); 3 mm (±0.1 mm) |
| Feature Accuracy | ±2 µm | Surface Flatness | <30 µm (length <100 mm) <60 µm (length <200 mm) |
| Appearance Accuracy | ±0.05 mm | Size Range | Min: 2×2 mm (±0.1 mm); Max: 228×228 mm (±0.1 mm) |
| Coating | Chromium | Surface Roughness | <0.2–0.7 µm |
| Light / Matte Coating | Matte chromium coating; bright chrome coating | Coefficient of Thermal Expansion (40–400°C) | <6.7×10⁻⁶/K |
| Reflectance | <12.88% @550nm <10.62% @650nm <12.23% @750nm (Matte: <9.56% @550nm, <1.89% @650nm, <11.168% @750nm) |
Unit Weight | ≥3.66 g/cm³ |
| Coating Thickness | 100–120 nm | Rockwell Hardness | ≥80 HRA |
| Positive and Negative Shapes | Positive film: opaque pattern Negative film: transparent pattern |
Appearance and Shape | Laser cutting of any shape; square; ellipse |
| Protective Layer | The thin film above the chromium layer makes the chromium pattern more durable | Special Shape | Punch; chamfer; oblique angle |
| Manufacturing Process | Lithography (film lithography machine) | Application | Used for transmission / backlight / functional testing |
| Minimum Line Width | 10 µm / 30 µm optional | Coefficient of Expansion | Film shrinks when heated and expands when cooled; 10 µm/°C of 1 m. When relative temperature is constant and humidity changes by 1°C, a film 1 m long will change by 10 µm (one ten-thousandth) |
| Feature Accuracy | ±10 µm | Transmittance Rate (400–700 nm) | >90%; ultraviolet <(400–700 nm)> infrared |
| Coating | Silver bromide | Film Substrate Thickness | 0.18 mm (±0.01 mm) |
| Coating Thickness | 2 µm | Maximum Size | 0.71×0.81 m (±0.1 mm, minimum line width 10 µm) 1.68×3.5 m (±0.1 mm, minimum line width 30 µm) |
| Optical Density (OD) | OD >4 when 100% black (OD value controllable in grayscale) | Appearance | Laser cutting, straight edge cutting, and circular hole hollowing are available |
| Color | Black grayscale, sine grayscale | — | — |
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