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Glass Metal Materials Checkerboard Calibration Board with 1um Precision and Customizable Size for Camera Calibration Target
OpenCV Checkerboard Calibration Board
,Glass Checkerboard Calibration Board
,Metal Calibration Board
The checkerboard calibration board is one of the most widely used tools for camera and vision system calibration. Its high-contrast black-and-white square pattern enables precise corner detection, allowing accurate estimation of intrinsic and extrinsic parameters. This ensures effective correction of lens distortion and reliable alignment of multi-camera or camera-to-robot systems.
Manufactured with strict tolerances on durable materials such as glass, metal, or composites, the board delivers excellent stability and repeatability. Compatible with popular vision libraries including OpenCV and Halcon, it is commonly applied in robotics, 3D reconstruction, industrial automation, and machine vision applications that require high calibration accuracy.
- Clear pattern corners for reliable detection
- High precision, with a maximum accuracy of 1 µm
- High contrast and non-reflective surface
- Supports diversified customization
Machine vision calibration across security, film and television, medical, camera, drone camera, photography studio, scientific research instrument, and other equipment applications.
The base material of the checkerboard calibration board is optional. Different base materials — such as glass, ceramic, film, and aluminum plate — can be customized according to different usage scenarios, environments, and accuracy requirements.
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Glass substrate | Quartz glass (fused silica) / soda glass |
| Minimum line width | 1 µm / 0.55 µm | Transmittance rate (@550 nm) | >95% |
| Feature accuracy | ±1 µm | Coefficient of thermal expansion (20–200 °C) | <5.0×10⁻⁷/K |
| Coating | Yellow chromium, bright chromium, blue chromium (low reflectivity) | Expansion ratio (20–200 °C) | 0.00006% (0.6 µm/°C of 1 m) |
| Reflectance | <13.4% @550 nm <1.8% @650 nm <2.67% @750 nm |
Surface flatness | <0.55 µm (length <50 mm) <2 µm (length <100 mm) <5 µm (length >100 mm) |
| Coating accuracy | 120 nm (±0.20 nm) | Surface roughness | <0.025 µm |
| Optical density (OD) | Yellow chromium 3 (blue 5) | Thickness | 1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm); 500×500×4.8 mm |
| White background | Minimum line width: 10 µm White background thickness: 40 µm (smooth white coating on the back) |
Minimum / maximum size | Min: 2×2 mm Max: 800×960 mm (±0.1 mm) |
| Positive & negative shapes | Positive: pattern opaque Negative: pattern translucent |
Appearance and shape | Square |
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Type | Matte chromium on matte ceramic; bright chrome on glossy ceramic |
| Type | Matte ceramic / glossy ceramic | Ceramic substrate | Zirconia / alumina |
| Minimum line width | 4 µm (matte) / 2 µm (glossy) | Thickness | 1 mm (±0.1 mm, common); 2 mm (common); 3 mm (±0.1 mm) |
| Feature accuracy | ±2 µm | Surface flatness | <30 µm (length <100 mm) <60 µm (length <200 mm) |
| Appearance accuracy | ±0.05 mm | Size range | Min: 2×2 mm (±0.1 mm) Max: 228×228 mm (±0.1 mm) |
| Coating | Chromium | Surface roughness | <0.2–0.7 µm |
| Light / matte coating | Matte chromium coating / bright chrome coating | Coefficient of thermal expansion (40–400 °C) | <6.7×10⁻⁶/K |
| Reflectance | <12.88% @550 nm <10.62% @650 nm <12.23% @750 nm (matte) <9.56% @550 nm <1.89% @650 nm <11.168% @750 nm (glossy) |
Unit weight | ≥3.66 g/cm³ |
| Coating thickness | 100–120 nm | Rockwell hardness | ≥80 HRA |
| Positive and negative shapes | Positive film: opaque pattern Negative film: transparent pattern |
Appearance and shape | Laser cutting of any shape; square; ellipse |
| Protective layer | The thin film above the chromium layer makes the chromium pattern more durable | Special shape | Punch; chamfer; oblique angle |
| Design | Specification | Film Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Lithography (film lithography machine) | Application | Used for transmission / backlight / functional testing |
| Minimum line width | 10 µm / 30 µm optional | Coefficient of expansion | Film shrinks when heated and expands when cooled |
| Feature accuracy | ±10 µm | Dimensional stability | 10 µm/°C of 1 m. When the relative temperature is constant and humidity changes by 1 °C, a film of 1 m length changes by 10 µm (one ten-thousandth) |
| Coating | Silver bromide | Transmittance rate (400–700 nm) | >90%; ultraviolet <(400–700 nm)> infrared |
| Coating thickness | 2 µm | Film substrate thickness | 0.18 mm (±0.01 mm) |
| Optical density (OD) | OD >4 when 100% black (OD value controllable in grayscale) | Maximum size | 0.71×0.81 m (±0.1 mm, minimum line width 10 µm) 1.68×3.5 m (±0.1 mm, minimum line width 30 µm) |
| Color | Black grayscale, sine grayscale | Appearance | Laser cutting, straight edge cutting, and circular hole hollowing are available |
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