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Micron Level High Precision AprilGrid Calibration Board QR Code Calibration Board with Customizable Size and Non-Reflective Surface

Micron Level High Precision AprilGrid Calibration Board QR Code Calibration Board with Customizable Size and Non-Reflective Surface
country of origin
China
Brand Name
DFOPTIX
certificate
ISO9001
MOQ
10
payment method
T/T
Supply Capacity
The average monthly production capacity for calibration plates and film is 300,000 pieces
Product Details
Highlight:

QR Code Calibration Board

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AprilGrid Calibration Board

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Calibration Board Customizable Size

Material: Aluminum,Glass And Ceramic Materials Are Optional
Specification: Customizable Size
Shipping Option: FedEx And UPS
Product Description
Detailed Specifications & Features
Product Overview

The AprilGrid Calibration Board features the AprilTag grid pattern for accurate camera calibration, lens distortion correction, and parameter estimation. The included bracket ensures stable mounting, making it ideal for industrial and robotic applications, with customizable sizes suitable for both indoor and outdoor use.

Key Features
  • Micron-level high precision — maximum accuracy of up to 1 µm
  • High contrast for clear and easy identification
  • Non-reflective surface for reliable imaging
  • Multi-format drawing customization supported
Applicable Scenarios

Machine vision calibration for security, film and television, medical, camera, drone camera, photography studio, scientific research instruments, and other equipment.

Substrate Options

The substrate for the QR code calibration plate is optional. Different substrates — such as glass, ceramic, and aluminum plate — can be customized according to different usage scenarios, environments, and accuracy requirements.

1. Glass Substrate Parameters
Design Specification Substrate Specification
Manufacturing Process Photolithography Glass substrate Quartz glass (fused silica) / soda glass
Minimum line width 1 µm / 0.55 µm Transmittance rate (@550 nm) >95%
Feature accuracy ±1 µm Coefficient of thermal expansion (20–200 °C) <5.0×10⁻⁷/K
Coating Yellow chromium, bright chromium, blue chromium (low reflectivity) Expansion ratio (20–200 °C) 0.00006% (0.6 µm/°C of 1 m)
Reflectance <13.4% @550 nm
<1.8% @650 nm
<2.67% @750 nm
Surface flatness <0.55 µm (length <50 mm)
<2 µm (length <100 mm)
<5 µm (length >100 mm)
Coating accuracy 120 nm (±0.20 nm) Surface roughness <0.025 µm
Optical density OD Yellow chromium 3 (blue 5) Thickness 1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm) (500×500×4.8)
White background Minimum line width: 10 µm
White background thickness: 40 µm (smooth white coating on the back)
Minimum / maximum size Min: 2×2 mm
Max: 800×960 mm (±0.1 mm)
Positive & negative shapes Positive: pattern opaque
Negative: pattern translucent
Appearance and shape Square
2. Ceramic Substrate Parameters
Design Specification Substrate Specification
Manufacturing Process Photolithography Type Matte chromium on matte ceramics / bright chrome on glossy ceramics
Type Matte ceramic / glossy ceramic Ceramic substrate Zirconia / alumina
Minimum line width 4 µm (matte) / 2 µm (glossy) Thickness 1 mm (±0.1 mm, common) / 2 mm (common) / 3 mm (±0.1 mm)
Feature accuracy ±2 µm Surface flatness <30 µm (length <100 mm)
<60 µm (length <200 mm)
Appearance accuracy ±0.05 mm Size range Min: 2×2 mm (±0.1 mm)
Max: 228×228 mm (±0.1 mm)
Coating Chromium Surface roughness <0.2–0.7 µm
Light / matte coating Matte chromium coating / bright chrome coating Coefficient of thermal expansion (40–400 °C) <6.7×10⁻⁶/K
Reflectance <12.88% @550 nm
<10.62% @650 nm
<12.23% @750 nm
(glossy: <9.56% @550 nm, <1.89% @650 nm, <11.168% @750 nm)
Unit weight ≥3.66 g/cm³
Coating thickness 100–120 nm Rockwell hardness ≥80 HRA
Positive and negative shapes Positive film: opaque pattern
Negative film: transparent pattern
Appearance and shape Laser cutting of any shape: square, ellipse
Protective layer The thin film above the chromium layer makes the chromium pattern more durable Special shape Punch, chamfer, oblique angle
3. Film Substrate Parameters
Design Specification Film Substrate Specification
Manufacturing Process Lithography (film lithography machine) Application Used for transmission / backlight / functional testing
Minimum line width 10 µm / 30 µm optional Coefficient of expansion Film shrinks when heated and expands when cooled
Feature accuracy ±10 µm Dimensional stability 10 µm/°C of 1 m; when relative temperature is constant and humidity changes by 1 °C, a film of 1 m length changes by 10 µm (one ten-thousandth)
Coating Silver bromide Transmittance rate (400–700 nm) >90%; ultraviolet <(400–700 nm)> infrared
Coating thickness 2 µm Film substrate thickness 0.18 mm (±0.01 mm)
Optical density OD OD>4 when 100% black (OD value controllable in grayscale) Maximum size 0.71×0.81 m (±0.1 mm) (minimum line width 10 µm)
1.68×3.5 m (±0.1 mm) (minimum line width 30 µm)
Color Black grayscale, sine grayscale Appearance Laser cutting, straight edge cutting, and circular hole hollowing are available
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