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Large Sized Photoplotting Film Photomask Film with 8μm Minimum Line Width and 50800dpi Resolution for PCB Manufacturing

Large Sized Photoplotting Film Photomask Film with 8μm Minimum Line Width and 50800dpi Resolution for PCB Manufacturing
country of origin
China
Brand Name
DFOPTIX
certificate
ISO9001
MOQ
10
payment method
T/T
Supply Capacity
The average monthly production capacity for calibration plates and film is 300,000 pieces
Product Details
Highlight:

Light Painting Film 0.18mm

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Large Light Painting Film

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Large Photoplotting Film

Material: Film
Minimum Line Width: 8μm
Resolution: 8000dpi/16000dpi/25400dpi/50800dpi
Specification: Max. Width 3500mm, Max. Height 1680mm
Shipping Option: FedEx And UPS
Product Description
Detailed Specifications & Features
Product Overview

Large-Size Photoplotting Film is a type of mask plate made of transparent materials (usually quartz or glass) with a photosensitive coating for pattern transfer on its surface. It is commonly used to transfer complex or high-precision patterns onto circuit boards, silicon wafers, or other substrates through the photolithography process. Compared with traditional small-size films, large-size photoplotting films are mainly characterized by larger dimensions, higher manufacturing process requirements, and stricter requirements for optical precision and materials.

Large-size photoplotting films are typically used in precision fields where large-area pattern transfer is required, such as large-size Printed Circuit Boards (PCBs), large-size display screens (LCD, OLED, etc.), large silicon wafers in semiconductor manufacturing, and the production of optical components.

Common Specifications
MaterialKodak, AgfaThickness0.18 mm
Minimum Line Width8 μmLine Width Error1–2 μm
Resolution8000 dpi / 16000 dpi / 25400 dpi / 50800 dpiMaximum Photoplotting Format1680 × 3500 mm

Professional customization is supported to meet specific project requirements.

Working Principle

The working principle of large-size photoplotting film is similar to that of traditional films, realizing pattern transfer based on the photolithography process. The specific steps are as follows:

  1. Design and Output: Designers first complete the design of circuits or patterns using Computer-Aided Design (CAD) software, and convert the design files into formats suitable for photolithography, usually Gerber files or digital optical data.
  2. Mask Plate Fabrication: According to the design files, laser or electron beam etching technology is used to etch precise patterns on transparent materials (such as quartz glass). Due to the large size of the mask plate, extremely high precision and stability are required during the manufacturing process to ensure the consistency of patterns within the large size range.
  3. Exposure and Transfer: Align the fabricated large-size photoplotting film with the substrate (such as a circuit board or silicon wafer) and perform photolithography exposure. A light source (usually ultraviolet light) irradiates the surface of the photosensitive material through the transparent areas of the film, and the photosensitive coating in the unirradiated areas undergoes a chemical reaction, finally forming the required pattern.
  4. Development and Etching: After exposure, the unexposed parts of the photosensitive coating are removed to complete the pattern transfer. Next, unnecessary materials are removed through processes such as etching, finally forming circuit or optical structures.
  5. Post-processing and Inspection: After the transfer is completed, the circuit board or chip is usually inspected to ensure the accuracy of the pattern and that there are no errors or defects. Then other necessary process steps are carried out, such as metal deposition and welding.
Key Features
  • Large-Size Adaptability: As the name suggests, large-size photoplotting films are designed for large-area or large-size pattern transfer, and are usually used for large-size circuit boards, optical components, and similar applications.
  • High Precision and High Resolution: Large-size photoplotting films must have high-resolution and high-precision pattern transfer capabilities. Their precision requirements are much higher than those of ordinary films, as they need to ensure the stability and consistency of patterns over a large area.
  • High-Quality Materials: Large-size photoplotting films usually use high-transparency quartz or glass as substrates. These materials have excellent optical properties, which can ensure light transmittance and accurate pattern transfer.
  • Complex Manufacturing Process: The manufacturing process of large-size photoplotting films has very high requirements, usually requiring advanced photolithography equipment and precision laser etching technology, with a long production cycle and high cost.
  • Durability and Stability: Large-size photoplotting films need to withstand high-intensity light and chemical corrosion during the production process. Therefore, the durability and stability of their materials must undergo strict testing to ensure no deformation or damage during long-term use.
Application Fields
  • Large-Size Printed Circuit Board (PCB) Production: Large-size photoplotting films are commonly used in the manufacturing of large-size circuit boards (such as server boards and large industrial control boards). Especially in large PCB designs that require precise circuit patterns, accurate pattern transfer is crucial to the function of the entire circuit board.
  • Semiconductor Manufacturing: In semiconductor manufacturing, especially for large silicon wafers, large-size photoplotting films are used for pattern transfer to ensure that the circuit patterns in the chips are accurate and error-free. With the advancement of semiconductor technology, the complexity and size of chip designs are gradually increasing, and the demand for large-size photoplotting films is also growing.
  • Display Manufacturing: In the production process of large-size Liquid Crystal Displays (LCDs) or Organic Light-Emitting Diode (OLED) displays, large-size photoplotting films are used for pattern transfer to ensure the precision of circuits and display units on large screens. This is crucial for high-definition displays, TV screens, and some large display devices.
  • Optical Device Production: Optical devices (such as optical lenses and optical components of projectors) require the use of large-size photoplotting films for precise transfer of optical patterns during the production process.
  • Solar Cell Manufacturing: In the production process of solar panels, large-size photoplotting films are used to transfer details such as electrode patterns to ensure the conductivity and efficiency of solar cells.
  • LED Lighting: Large-size photoplotting films are also widely used in the manufacturing of LED panels, especially in application scenarios that require large-size circuit boards and high-precision pattern transfer.
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