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High Positional Accuracy Circular Dot Calibration Board with 1um Precision and Customizable Size Vision Calibration Target
Halcon Circular Dot Calibration Board
,Camera Circular Dot Calibration Board
,Robotics Circular Dot Calibration Board
The Halcon Circular Dot Calibration Board is a high-precision calibration tool engineered for optical systems, ensuring optimal camera calibration, lens distortion correction, and reliable system performance evaluation. Manufactured using advanced photolithography technology, it delivers exceptional accuracy with micron-level precision, making it ideal for high-resolution imaging systems and microscopic applications. Its durable, heat-resistant material guarantees long-term stability, while the precise dot pattern ensures uniformity across the entire board for consistent, reliable calibration results. The board is fully customizable to meet diverse calibration requirements, making it well suited for industrial cameras, robotics, and automated vision systems.
Designed for machine vision calibration across a wide range of equipment, including security systems, film and television production, medical imaging, cameras, drone cameras, photography studios, scientific research instruments, and other precision optical devices.
The base material of the dot calibration plate is selectable. Different substrates — such as glass, ceramic, film, and aluminum plate — can be customized according to specific usage scenarios, operating environments, and accuracy requirements.
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Glass Substrate | Quartz glass (fused silica) / soda glass |
| Minimum Line Width | 1 µm / 0.55 µm | Transmittance Rate (@550nm) | >95% |
| Feature Accuracy | ±1 µm | Coefficient of Thermal Expansion (20–200°C) | <5.0×10⁻⁷/K |
| Coating | Yellow chromium, bright chromium, blue chromium (low reflectivity) | Expansion Ratio (20–200°C) | 0.00006% (0.6 µm/°C of 1 m) |
| Reflectance | <13.4% @550nm <1.8% @650nm <2.67% @750nm |
Surface Flatness | <0.55 µm (length <50 mm) <2 µm (length <100 mm) <5 µm (length >100 mm) |
| Coating Accuracy | 120 nm (±0.20 nm) | Surface Roughness | <0.025 µm |
| Optical Density (OD) | Yellow chromium 3 (blue 5) | Thickness | 1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm); 500×500×4.8 mm |
| White Background | Minimum line width: 10 µm White background thickness: 40 µm (smooth white coating on the back) |
Minimum / Maximum Size | Min: 2×2 mm Max: 800×960 mm (±0.1 mm) |
| Positive & Negative Shapes | Positive: pattern opaque Negative: pattern translucent |
Appearance and Shape | Square |
| Design | Specification | Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Photolithography | Type | Matte chromium on matte ceramics; bright chrome on glossy ceramics |
| Type | Matte ceramic / glossy ceramic | Ceramic Substrate | Zirconia / alumina |
| Minimum Line Width | 4 µm (matte) / 2 µm (glossy) | Thickness | 1 mm (±0.1 mm, common); 2 mm (common); 3 mm (±0.1 mm) |
| Feature Accuracy | ±2 µm | Surface Flatness | <30 µm (length <100 mm); <60 µm (length <200 mm) |
| Appearance Accuracy | ±0.05 mm | Size Range | Min: 2×2 mm (±0.1 mm); Max: 228×228 mm (±0.1 mm) |
| Coating | Chromium | Surface Roughness | <0.2–0.7 µm |
| Light / Matte Coating | Matte chromium coating / bright chrome coating | Coefficient of Thermal Expansion (40–400°C) | <6.7×10⁻⁶/K |
| Reflectance | <12.88% @550nm <10.62% @650nm <12.23% @750nm (Matte: <9.56% @550nm, <1.89% @650nm, <11.168% @750nm) |
Unit Weight | ≥3.66 g/cm³ |
| Coating Thickness | 100–120 nm | Rockwell Hardness | ≥80 HRA |
| Positive and Negative Shapes | Positive film: opaque pattern Negative film: transparent pattern |
Appearance and Shape | Laser cutting of any shape; square; ellipse |
| Protective Layer | Thin film above the chromium layer makes the chromium pattern more durable | Special Shape | Punch; chamfer; oblique angle |
| Design | Specification | Film Substrate | Specification |
|---|---|---|---|
| Manufacturing Process | Lithography (film lithography machine) | Application | Used for transmission / backlight / functional testing |
| Minimum Line Width | 10 µm / 30 µm optional | Coefficient of Expansion | Film shrinks when heated and expands when cooled; 10 µm/°C of 1 m. When relative temperature is constant and humidity changes by 1°C, a 1 m film changes by 10 µm (one ten-thousandth) |
| Feature Accuracy | ±10 µm | Transmittance Rate (400–700 nm) | >90%; ultraviolet < (400–700 nm) > infrared |
| Coating | Silver bromide | Film Substrate Thickness | 0.18 mm (±0.01 mm) |
| Coating Thickness | 2 µm | Maximum Size | 0.71×0.81 m (±0.1 mm) (minimum line width 10 µm); 1.68×3.5 m (±0.1 mm) (minimum line width 30 µm) |
| Optical Density (OD) | OD >4 when 100% black (OD value controllable in grayscale) | Appearance | Laser cutting, straight edge cutting, and circular hole hollowing available |
| Color | Black grayscale, sine grayscale |
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