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1um Precision Non-Reflective High Contrast Vision Calibration Target Calibration Board for Machine Vision Systems

1um Precision Non-Reflective High Contrast Vision Calibration Target Calibration Board for Machine Vision Systems
country of origin
China
Brand Name
DFOPTIX
certificate
ISO9001
MOQ
1
payment method
T/T
Supply Capacity
The average monthly production capacity for calibration plates and film is 300,000 pieces
Product Details
Highlight:

Vision Calibration Target High Contrast

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Vision Calibration Target Non Reflective

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QR Code Calibration Target

Material: Glass, Ceramic, Film, Aluminum Can Be Customized
Specification: The Precision Can Reach 1um, And The Size Can Be Customized Up To 1.68*3500mm According To Different Materials
Shipping Option: FedEx And UPS
Product Description
Detailed Specifications & Features
Hikvision II QR Code Calibration Board

A high-precision QR code vision calibration target engineered for machine vision systems. Featuring micron-level accuracy, high contrast, and a non-reflective finish, it delivers clear, reliable pattern recognition across demanding industrial, medical, and scientific applications.

Micron-level high precision (up to 1 µm)
High contrast, non-reflective surface
Clear and easy to identify
Multi-format drawing customization supported
Applicable Scenarios

Designed for machine vision calibration across a wide range of equipment, including security systems, film and television production, medical imaging, cameras, drone cameras, photography studios, and scientific research instruments.

Substrate Options

The QR code calibration plate substrate is optional. Different substrates — such as glass, ceramic, and aluminum plate — can be customized to match specific usage scenarios, environments, and accuracy requirements.

1. Glass Substrate Parameters
Manufacturing ProcessPhotolithographyGlass SubstrateQuartz glass (fused silica) / soda glass
Minimum Line Width1 µm / 0.55 µmTransmittance Rate (@550 nm)>95%
Feature Accuracy±1 µmCoefficient of Thermal Expansion (20–200 °C)<5.0×10⁻⁷/K
CoatingYellow chromium, bright chromium, blue chromium (low reflectivity)Expansion Ratio (20–200 °C)0.00006% (0.6 µm/°C of 1 m)
Reflectance<13.4% @550 nm
<1.8% @650 nm
<2.67% @750 nm
Surface Flatness<0.55 µm (length <50 mm)
<2 µm (length <100 mm)
<5 µm (length >100 mm)
Coating Accuracy120 nm (±0.20 nm)Surface Roughness<0.025 µm
Optical Density ODYellow chromium 3 (blue 5)Thickness1 mm, 1.6 mm, 2.3 mm, 3 mm (±0.2 mm) (500×500×4.8)
White BackgroundMinimum line width: 10 µm
White background thickness: 40 µm (smooth white coating on the back)
Minimum / Maximum SizeMin: 2×2 mm
Max: 800×960 mm (±0.1 mm)
Positive & Negative ShapesPositive: pattern opaque
Negative: pattern translucent
Appearance and ShapeSquare
2. Ceramic Substrate Parameters
Manufacturing ProcessPhotolithographyTypeMatte chromium on matte ceramics
Bright chrome on glossy ceramics
TypeMatte ceramic / Glossy ceramicCeramic SubstrateZirconia / Alumina
Minimum Line Width4 µm (matte) / 2 µm (glossy)Thickness1 mm (±0.1 mm, common)
2 mm (common)
3 mm (±0.1 mm)
Feature Accuracy±2 µmSurface Flatness<30 µm (length <100 mm)
<60 µm (length <200 mm)
Appearance Accuracy±0.05 mmSize RangeMin: 2×2 mm (±0.1 mm)
Max: 228×228 mm (±0.1 mm)
CoatingChromiumSurface Roughness<0.2–0.7 µm
Light / Matte CoatingMatte chromium coating / bright chrome coatingCoefficient of Thermal Expansion (40–400 °C)<6.7×10⁻⁶/K
Reflectance<12.88% @550 nm
<10.62% @650 nm
<12.23% @750 nm
(matte)
<9.56% @550 nm
<1.89% @650 nm
<11.168% @750 nm
(glossy)
Unit Weight≥3.66 g/cm³
Coating Thickness100–120 nmRockwell Hardness≥80 HRA
Positive and Negative ShapesPositive film: opaque pattern
Negative film: transparent pattern
Appearance and ShapeLaser cutting of any shape: square, ellipse
Protective LayerThe thin film above the chromium layer makes the chromium pattern more durableSpecial ShapePunch, chamfer, oblique angle
3. Film Substrate Parameters
Manufacturing ProcessLithography (film lithography machine)ApplicationUsed for transmission / backlight / functional testing
Minimum Line Width10 µm / 30 µm optionalCoefficient of ExpansionFilm shrinks when heated and expands when cooled
Feature Accuracy±10 µmDimensional Stability10 µm/°C of 1 m. When relative temperature is constant and humidity changes by 1 °C, a film of 1 m length changes by 10 µm (one ten-thousandth)
CoatingSilver bromideTransmittance Rate (400–700 nm)>90% (ultraviolet <400–700 nm > infrared)
Coating Thickness2 µmFilm Substrate Thickness0.18 mm (±0.01 mm)
Optical Density ODOD >4 when 100% black (OD value controllable in grayscale)Maximum Size0.71×0.81 m (±0.1 mm) (minimum line width 10 µm)
1.68×3.5 m (±0.1 mm) (minimum line width 30 µm)
ColorBlack grayscale, sine grayscaleAppearanceLaser cutting, straight edge cutting, and circular hole hollowing are available
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