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OpenCV Checkerboard Calibration Board Glass Metal Materials
OpenCV Checkerboard Calibration Board
,Glass Checkerboard Calibration Board
,Metal Calibration Board
OpenCV Calibration Board
The Checkerboard Calibration Board is one of the most widely used tools for camera and vision system calibration. Its high-contrast black and white square pattern allows precise corner detection, enabling accurate intrinsic and extrinsic parameter estimation. This ensures effective correction of lens distortion and reliable alignment of multi-camera or camera-to-robot systems. Manufactured with strict tolerances on durable materials such as glass, metal, or composites, the board provides excellent stability and repeatability. Compatible with popular vision libraries like OpenCV and Halcon, it is commonly applied in robotics, 3D reconstruction, industrial automation, and machine vision applications requiring high calibration accuracy.
Product Features: Clear pattern corners, high precision, high contrast/non-reflective, High precision (with a maximum accuracy of 1um),supports diversified customization
Applicable scenarios: Machine vision calibration (security, film and television, medical, cameras, drone cameras, photography studios, scientific research instruments, and other equipment)
Base material: The base material of the checkerboard calibration board is optional, and different base materials (such as glass, ceramic, film, aluminum plate, etc.) can be customized according to different usage scenarios, environments, and accuracy requirements.
1. Glass substrate parameters:
| Design |
Substrate |
||
|
Manufacturing Process |
Photolithography |
Glass substrate |
Quartz glass (fused silica)/soda glass |
|
Minimum line width |
1µm / 0.55µm |
Transmittance rate(@550nm) |
>95% |
|
Feature accuracy |
±1µm |
Coefficient of thermal expansion (20-200°C) |
<5.0×10⁻⁷/K |
|
Coating |
Yellow chromium, bright chromium , blue chromium (low reflectivity) |
Expansion ratio(20-200°C) |
0.00006% (0.6µm/°C of 1m) |
|
Reflectance |
< 13.4% @550nm |
Surface flatness |
<0.55µm (length<50mm) |
|
< 1.8% @650nm |
<2µm (length<100mm) |
||
|
< 2.67% @750nm |
<5µm (length>100mm) |
||
|
Coating accuracy |
120nm (±0.20nm) |
Surface roughness |
<0.025µm |
|
Optical density OD |
Yellow Chromium 3 (Blue 5) |
Thickness |
1mm,1.6mm,2.3mm,3mm(±0.2mm)(500*500*4.8) |
|
White background |
Minimum line width:10µm |
Minimum/maximum size |
Min: 2×2 mm |
|
White background thickness: 40 µ m (smooth white coating on the back) |
Max: 800×960mm (±0.1mm) |
||
|
Positive & negative shapes |
Positive: pattern opaque Negative: pattern translucent |
Appearance and shape |
Square |
2. Ceramic substrate parameters:
|
Design |
Substrate |
|||||
|
Manufacturing Process |
Photolithography |
Type |
Matte chromium on matte ceramics |
Bright chrome on glossy ceramics |
|
|
|
Type |
Matte ceramic |
Glossy ceramic |
Ceramic substrate |
Zirconia / Alumina |
||
|
Minimum line width |
4µm |
2µm |
Thickness |
1mm (±0.1mm, common) |
2mm (common) |
3mm (±0.1mm) |
|
Feature accuracy |
±2µm |
±2µm |
Surface flatness |
<30µm (length<100mm) |
<60µm (length<200mm) |
|
|
Appearance accuracy |
±0.05mm |
±0.05mm |
Surface flatness |
MIN: 2×2mm (±0.1mm); MAX: 228×228mm (±0.1mm) |
||
|
Coating |
Chromium |
Chromium |
Surface roughness |
<0.2-0.7µm |
||
|
Light coating/matte coating |
Matte chromium coating |
Bright chrome coating |
Coefficient of thermal expansion (40-400°C) |
<6.7×10⁻⁶/K |
||
|
ReflectaCnce |
< 12.88% @550nm |
< 9.56% @550nm |
Unit weight |
≥ 3.66 g/cm³ |
||
|
< 10.62% @650nm |
< 1.89% @650nm |
|||||
|
< 12.23% @750nm |
< 11.168% @750nm |
|||||
|
Coating thickness |
100-120nm |
100-120nm |
Rockwell hardness |
≥80 HRA |
||
|
Positive and negative shapes |
Positive film: opaque pattern, Negative film: transparent pattern |
Appearance and shape |
Laser cutting of any shape |
Square |
Ellipse |
|
|
Protective layer |
The thin film above the chromium layer makes the chromium pattern more durable |
Special shape |
Punch |
Chamfer |
Oblique angle |
|
3. Film substrate parameters:
|
Design |
Film substrate |
||
|
Manufacturing Process |
Lithography (Film Lithography Machine) |
Application |
Used for transmission/backlight /functional testing |
|
Minimum line width |
10 µ m/30 µ m optional |
Coefficient of expansion |
Film shrinks when heated and expands when cooled |
|
Feature accuracy
|
±10µm |
10µm/°C of 1m When the relative temperature is constant,
When the humidity changes by 1 ° C,
A film with a length of 1m will change by 10 µ m (one ten thousandth)
|
|
|
Coating |
Silver bromide |
Transmittance rate(400~700nm) |
>90% ultraviolet<(400~700nm)>infrared |
|
Coating thickness |
2µm |
Film substrate thickness |
0.18mm (±0.01mm) |
|
Optical density OD |
OD>4 when 100% black
(OD value controllable in grayscale)
|
Maximum size |
0.71×0.81m (±0.1mm)(minimum line width 10µm) 1.68×3.5m (±0.1mm)(minimum line width 30µm) |
|
color |
Black grayscale, sine grayscale |
Appearance |
Laser cutting, straight edge cutting, and circular hole hollowing are available |
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